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  1. Image lithography in telluride suboxide thin film through controlling “virtual” bandgap

  2. In this work, TeO0.7 thin films were prepared by the reactive magnetron-controlling sputtering method. Complex gray-scale patterns were successfully fabricated on TeO0.7 thin films through the laser direct writing method. The structural origin of TeO
  3. 所属分类:其它

    • 发布日期:2021-02-07
    • 文件大小:810kb
    • 提供者:weixin_38551938