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  1. Interface characterization of Mo/Si multilayers

  2. Complementary analysis techniques are applied in this work to study the interface structure of Mo/Si multilayers. The samples are characterized by grazing incident x-ray reflectivity, x-ray photoelectron spectroscopy, high-resolution transmission ele
  3. 所属分类:其它

    • 发布日期:2021-02-07
    • 文件大小:696kb
    • 提供者:weixin_38732454