文件名称:
Lithography Process Control_by Harry J. Levinson
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文件大小: 13mb
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上传时间: 2015-05-25
详细说明： To understand this text there are some prerequisites. A basic foundation in lithography science is assumed. The SPIE Handbook on Microlithography, Micromachining and Microfabrication. Volume 1: Microlithography l provides a suitable introduction. It is also assumed that the reader has had some introduction to basic statistical concepts and statistical process control. It is my intention that this text be a self-contained tutorial on lithography process control for readers familiar with the prerequisite lithography science and ba sic statistical process control, although some subjects may involve a higher level of mathematical sophistication than others. The text covers the subject of lithography process control at several levels. Discussions of some very basic elements of statistical process control and lithography science are included, because, when trying to control a lithography process, a number of subtle problems arise that are related to fundamental issues. To most readers, the information presented on the foundations of statistical process control should be familiar. Nevertheless, it is useful to review the foundations of statistical process control, in order to clearly identify those circumstances in which the method may be applied, and where it needs to be applied with particular care. This inclusion of basic topics also allows the text to serve as an introduction to process control for the novice lithography engineer and as a reference for experienced engineers. More advanced topics are also included to varying ...展开收缩
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