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  1. Aluminum film microdeposition at 775 nm by femtosecond laser-induced forward transfer

  2. Micro-deposition of an aluminum film of 500-nm thickness on a quartz substrate was demonstrated by laser-induced forward transfer (LIFT) using a femtosecond laser pulse. With the help of atomic force microscopy (AFM) and scanning electron microscopy
  3. 所属分类:其它

    • 发布日期:2021-02-10
    • 文件大小:192kb
    • 提供者:weixin_38600253