New applications of evanescent imaging for microlithography are introduced. The use of evanescent wave lithography (EWL) has been employed for 26nm resolution at 1.85NA using a 193nm ArF excimer laser wavelength to record images in a photoresist wit
As the requirements of the semiconductor industry have become more demanding in terms of resolution and speed it has been necessary to push photoresist materials far beyond the capabilities previously envisioned. Currently there is significant world
集成电路工艺：Deep-submicron process technology
Describe such deep-submicron process technology and intended to provide semiconductor engineers and researchers with a comprehensive , state-of-the-art reference about these emerging and leading-edge process.C
A Te-free binary phase change material SbBi is proposed as a new inorganic photoresist for heat-mode lithography. It shows good film-forming ability (surface roughness <1 nm), low threshold power for crystallization (2 mW), and high etching select
X-ray Gabor in line holograms of wire-like object is recorded in photoresist. After enlarged to film by microscope and digitized by scanning microdensitometer, the holograms are reconstructed by using numerical methods, and the origin objects can be
A novel direct writing technique using submicron-diameter fibers is presented. This technique adopts contact mode in the process of writing, and submicron lines with different widths have been obtained. Experimental results demonstrate that the resol
A set of two-dimensional (2D) binary codes are created by the calculation of the speckle contrast in line scan laser display system. According to the 2D binary code, phase plates are fabricated by etched glass or photoresist with different thicknesse
A structure which consists of photoresist film sandwiched by Ag nano-particle and metal film is proposed to modify localized hotspot both in transversal and longitudinal direction. It shows that there is strong plasmonic coupling between Ag nano-part
In this study, a full-color emission red–green–blue (RGB) quantum-dot (QD)-based micro-light-emitting-diode (micro-LED) array with the reduced optical cross-talk effect by a photoresist mold has been demonstrated. The UV micro-LED array is used as an
